In:
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, American Vacuum Society, Vol. 6, No. 1 ( 1988-01-01), p. 122-126
Kurzfassung:
Advances in nanolithography using electron-beam techniques have allowed a great variety of quantum devices to be fabricated and tested. The critical dimensions governing the design of these devices will be discussed. Fabrication and experimental results of several such devices for studies will be reported. These include structures aiming at the observation of the electrostatic Aharonov–Bohm effect and nonlocal oscillations, superconducting weak links, and devices for the investigation of quantum scattering effects.
Materialart:
Online-Ressource
ISSN:
0734-211X
,
2327-9877
Sprache:
Englisch
Verlag:
American Vacuum Society
Publikationsdatum:
1988
ZDB Id:
3117331-7
ZDB Id:
1475429-0
