In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 17, No. 2 ( 1999-03-01), p. 705-709
Kurzfassung:
We have investigated the field emission properties of diamond films grown under substrate bias conditions in a microwave plasma chemical vapor deposition system, with a substrate temperature of 800 °C, microwave power of 600 W, and a total pressure of 11 Torr. One group of films was grown with a substrate bias of −100 V in gas mixtures of 1% N2 and 1%–20% CH4 in H2, while a second group of films was grown with a substrate bias ranging from +100 to −150 V in a gas mixture of 1%N2–10%CH4–89%H2. The field emission performance in terms of threshold field and emission current improved considerably as a function of increasing CH4 concentration and negative bias voltage. Ultraviolet Raman analysis showed that the field emission enhancement resulting from an increase in CH4 concentration from 1% to 5% correlates with a decrease in the sp3 bonding character in the diamond film. The dependence of field emission on negative bias voltage appears to be correlated with ion bombardment-induced damage in the film during growth. The scanning electron microscopy image of the film grown with −150 V bias showed: smaller surface topographic features as compared to films grown under 0 and +100 V bias. The film grown with a bias of −150 V showed the lowest threshold field (∼2.0 V/μm) corresponding to an emission current density of 12.7 μA/cm2. J vs E0 measurements across a length of 40 mm over the film showed a uniform threshold field (2.0±0.55 V/μm). The film grown with a positive bias (+100 V) showed a relatively poor field emission performance.
Materialart:
Online-Ressource
ISSN:
1071-1023
,
1520-8567
Sprache:
Englisch
Verlag:
American Vacuum Society
Publikationsdatum:
1999
ZDB Id:
3117331-7
ZDB Id:
3117333-0
ZDB Id:
1475429-0
