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    Online Resource
    Online Resource
    IOP Publishing ; 1992
    In:  Japanese Journal of Applied Physics Vol. 31, No. 11R ( 1992-11-01), p. 3483-
    In: Japanese Journal of Applied Physics, IOP Publishing, Vol. 31, No. 11R ( 1992-11-01), p. 3483-
    Abstract: Reversible bonding of silicon wafers can be used to protect mirror polished silicon surface against organic contamination and particles. The present paper will report on debonding experiments of room-temperature bonded wafer pairs. It is found the water can significantly enhance the equilibrium crack length created by a blade inserted between two bonded wafers. A simple analytical model of this phenomenon is proposed which takes into account the interfacial energy between silicon and water. Combined with the “one-wafer bent” concept, it is anticipated that room-temperature reversibly bonded wafers with diameters up to 8 inches can be easily separated by using this technique. Water-enhanced debonding appears to be suitable for industrial applications due to its compatibility with main stream integrated circuit technology.
    Type of Medium: Online Resource
    ISSN: 0021-4922 , 1347-4065
    RVK:
    RVK:
    RVK:
    Language: Unknown
    Publisher: IOP Publishing
    Publication Date: 1992
    detail.hit.zdb_id: 218223-3
    detail.hit.zdb_id: 797294-5
    detail.hit.zdb_id: 2006801-3
    detail.hit.zdb_id: 797295-7
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