In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 31, No. 12S ( 1992-12-01), p. 4210-
Abstract:
Properties of DC-sputtered W-Ti absorber films such as internal stress, density and microstructure were systematically investigated for X-ray mask application. Smooth, stress-free amorphous W-Ti films with a comparatively high density of 16.5-17.0 g/cm 3 were obtained by optimizing several conditions: gas pressure, N 2 content in the working gas, DC power density and annealing temperature. The reproducibility of the film stress was about ±5×10 7 Pa. Reproducibility was found to be mainly determined by the degree to which the sputtering tool used could be controlled. Furthermore, it was confirmed that the optimized absorber films offered good stability under stress within 1×10 7 Pa when stored in an air atmosphere for more than 250 days.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.31.4210
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1992
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7