In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 31, No. 9A ( 1992-09-01), p. L1216-
Abstract:
The properties of Si surfaces treated in HF solution of various concentrations are characterized by photoluminescence (PL). The Si surfaces treated in 4.5%-HF solution show higher PL intensity than thermally oxidized Si, indicating low surface recombination velocity of the HF-treated Si surface. The effect of ambient gases on HF-treated Si surfaces is studied. The temporal variation of PL intensity is such that it shows an abrupt rise in nitrogen followed by saturation, and the saturated intensity shows only a slight change with time. In air or in oxygen, HF-treated Si shows a gradual or fast rise in PL intensity followed by saturation for a short period and the PL intensity eventually decreases with time presumably due to generation of recombination centers. It is suggested that the oxidation of HF-treated Si induces the formation of recombination centers at the surface.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.31.L1216
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1992
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
