In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 33, No. 7S ( 1994-07-01), p. 4469-
Abstract:
Spatial density profiles of sputtered In-atoms in a dc glow discharge with an indium-tin-oxide (ITO) cathode were measured by laser-induced fluorescence (LIF) spectroscopy. The absolute density of In-atoms was obtained by calibrating the LIF signal with the Rayleigh scattering signal for Ar. The spatial density profile of In-atoms had a peak at a certain distance from the cathode, and this peak density was about 10 11 cm -3 for pure Ar dc discharge at 0.2 Torr and 0.6 Wcm -2 . The behavior of spatial profiles of the absolute In-density was investigated as a function of dc discharge power, total pressure ( Ar+O 2 ), and O 2 partial pressure. Addition of a small amount of O 2 caused a drastic change in both the absolute In-density and its spatial distribution. From these observations, the reactive sputtering mechanism in a dc glow discharge is discussed.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.33.4469
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1994
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7