In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 33, No. 9R ( 1994-09-01), p. 5046-
Kurzfassung:
The three-dimensional spatial distribution of the CH 3 radical density has been calculated in the model of an RF discharge CH 4 plasma-enhanced chemical vapor deposition (P-CVD) chamber with parallel-plate electrodes in both cases with and without the White-type multiple reflection arrangement for absorption spectroscopy. The result showed that the CH 3 radical density decreased sharply and was negligible outside the plasma region irrespective of the geometry of the White-type multiple reflection of the glass tube. The deposition of carbon thin film was also measured. The result showed a tendency similar to that of the calculated distribution of the CH 3 radical. Therefore, it is concluded that the absorption path length of the laser beam can be defined as the length of the beam which passes through the plasma region in the case of CH 3 radical density measurement using infrared laser absorption spectroscopy.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.33.5046
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
1994
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
