In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 35, No. 11A ( 1996-11-01), p. L1422-
Kurzfassung:
Ablation of fused quartz by a 266, 532 or 1064 nm wavelength laser coupled with VUV laser (133–184 nm) was reported. With the VUV-266 nm laser system, high-quality ablation of fused quartz with a well-defined patterned structure and a surface roughness value as small as 46.2 nm at the circumference of the patterned structure was carried out. The ablation quality was poorer and the surface roughness value was higher, at 97.8 nm, when the VUV-532 nm laser system was used, but the ablation quality was still better than in the case of 266 or 532 nm single wavelength ablation. In contrast, clean ablation of fused quartz could not be achieved using the VUV-1064 nm laser system. The ablated region appeared to be an undefined crater-like structure, and the surface roughness value reached 121.0 nm, which were almost the same characteristics as in the case of 1064 nm single wavelength ablation. On the basis of the band structure of the fused quartz and the excited-state absorption determined through coupling of the VUV laser and the ablation laser (266, 532 or 1064 nm), the ablation mechanism was discussed.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.35.L1422
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
1996
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
