In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 35, No. 1B ( 1996-01-01), p. L94-
Kurzfassung:
Using a gas-assisted laser etching system, a digital etching method was demonstrated for Bi-Sr-Ca-Cu-O superconducting thin films. The etched surface was examined using an atomic force microscope. When NF 3 was used as the reactive gas, there was a laser fluence region in which the etching rate was nearly constant. This result suggests the existence of a self-stopping mechanism in the etching process, indicating the possible development of this method into a precise layer-by-layer etching technology for high- T c superconducting materials.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
1996
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7