In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 9R ( 1997-09-01), p. 5663-
Kurzfassung:
Pb(Zr,Ti)O 3 films were deposited by DC magnetron reactive sputtering on Pt/Ti/SiO 2 /Si and Pt/SiO 2 /Si substrates. The activation of oxygen by electron cyclotron resonance (ECR) plasma facilitated the incorporation of Pb. This enabled the fabrication of Pb(Zr,Ti)O 3 films with stoichiometric composition and perovskite structure even at a high Zr/Ti film concentration ratio and high substrate temperature and on Pt/SiO 2 /Si substrates where the pyrochlore second phase was usually observed when the films were deposited without oxygen activation.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.5663
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
1997
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
