In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 9S ( 1997-09-01), p. 5879-
Abstract:
The lattice parameters of BaTiO 3 –SrTiO 3 films prepared by chemcal vapor
deposition (CVD) were investigated. When the film thickness was 1500 nm, the lattice parameters were mainly determined by the thermal stress due to the thermal
expansion difference between the film and the substrate. The lattice parameters of epitaxially grown SrTiO 3 films on (100)MgO substrates increased with decreasing
film thickness, while those of polycrystalline films were independent of the film thickness down to 300 nm. They also increased with the Ti/(Sr+Ti) ratio for
epitaxially grown 500-nm-thick films, while those of polycrystalline films were independent of Ti/(Sr+Ti) ratio. Large lattice parameters were also observed for
the epitaxially grown (Ba 0.5 Sr 0.5 )TiO 3 film on a (100)MgO substrate but were not
observed for the epitaxially grown BaTiO 3 film on (100)MgO substrate. These
occurrences were closely related to the epitaxial growth of the film.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.5879
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7