In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 12S ( 1997-12-01), p. 7617-
Abstract:
We have developed a new, non-ammonia generating adhesion promoter, 4-trimethylsiloxy-3-pentene-2-one. Its adhesion ability to a substrate is superior to the conventional adhesion promoter, hexamethyldisilazane, due to its high reactivity. We obtained high-aspect-ratio and precise chemically amplified resist patterns on boron phosphorus silicate glass (BPSG) substrates using this new adhesion promoter.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.7617
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7