In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 37, No. 5R ( 1998-05-01), p. 2686-
Abstract:
The electric field strength in an ultrahigh-frequency (UHF) plasma,
as well as in an inductively coupled plasma (ICP), is measured with an electrostatic probe as a function of the radial and azimuthal positions
of the plasma reactor. On comparing the electric field distribution with the radial density profile of metastable chlorine ions measured
by Doppler-shifted laser-induced fluorescence, the electric field distribution is determined to be positively correlated to the
ionization rate distribution in the UHF plasma, while that in the ICP seems to be less dependent on the electric field distribution.
This phenomenon probably arises due to the large difference in the discharge frequency between the UHF plasma and the ICP.
No remarkable azimuthal dependence of the radial average velocity and the temperature of the metastable Cl + is
observed, indicating that the two-dimensionally uniform plasma is produced by UHF power through a spokewise antenna.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.37.2686
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1998
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
