In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 7S ( 1999-07-01), p. 4342-
Abstract:
In order to coat functional thin films onto the inside surface of
narrow tubes, a coaxial magnetron pulsed plasma (CMPP) device has been developed. The feature of this device is that deposited
conductive films play the role of an anode. Consequently, plasmas are generated away from the anode located at one end of the tube and
the distribution of film thickness widens with increasing deposition time. This is called the extended anode effect. The shifting
velocity of the main position for plasma generation was dependent on the properties of the target materials. The shifting velocity increased
with sputtering yield and decreased with the electrical resistivity of target materials.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.4342
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7