In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 39, No. 4R ( 2000-04-01), p. 1866-
Kurzfassung:
The correlation between the structure and the electron-field-emission behavior of chemical-vapor-deposited (CVD) diamond films and those of pulsed-laser-deposited (PLD) diamond-like carbon (DLC) films is investigated. The CVD films contain crystalline diamonds (sp 3 -bonds) separated from amorphous carbon (sp 2 -bonds), possessing a large electron-field-emission current density [( J e ) CVD =140 µA/cm 2 at 21.6 V/µm], a low turn-on field [( E 0 ) CVD =10 V/µm] and a single-value effective work function [(Φ e ) CVD =0.082 eV]. In contrast, the pulsed-laser-deposited DLC films exhibit even better electron field emission properties [( J e ) DLC =320 µA/cm 2 at 21.6 V/µm, ( E 0 ) DLC =8 V/µm] and a wide range of effective work functions [(Φ e ) DLC =0.016–0.031 eV]. The superior electron-field-emission properties of DLC films, as compared with those of CVD diamonds, are ascribed to their nanostructured grains, which contain a mixture of sp 3 -bonds and sp 2 -bonds.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.39.1866
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
2000
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
