In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 39, No. 12S ( 2000-12-01), p. 7067-
Kurzfassung:
Nanolithography of polysilane films is performed by means of a tapping-mode-scanning probe microscope (SPM) equipped with a carbon nanotube tip. The tapping mode enables us to perform finer lithography than that by the contact mode. Electrons injected from the tip directly groove the polysilane film. A constant current operation is more stable in the tapping-mode lithography than a constant bias voltage operation. The mechanism of direct lithography is discussed on the basis of the model that the excess electrons in the Si backbone break Si-Si bonds.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.39.7067
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
2000
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
