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Evaluation of Novel Sr Precursors for Atomic Layer Deposition of SrO Thin Film

Kim, Ki-Chul ; Cho, Kyuho ; Lee, Kwanghee ; [weitere]

The Electrochemical Society ; 2007

In: ECS Transactions Vol. 11, No. 7 ( 2007-09-28), p. 131-136

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In: ECS Transactions, The Electrochemical Society, Vol. 11, No. 7 ( 2007-09-28), p. 131-136

Kurzfassung: Novel strontium precursor - bis(1-methoxy-2,2,6,6-tetramethyl-3,5-heptanedionato)strontium (Sr(MTHD)2) - was prepared and its deposition properties were evaluated.High vapor pressure and excellent conformality of Sr(MTHD)2 make it promising candidate for ALD precursor to deposit high-k dielectric materials such as SrTiO3.

Materialart: Online-Ressource

ISSN: 1938-5862 , 1938-6737

URL: Article

DOI: 10.1149/1.2779077

Sprache: Unbekannt

Verlag: The Electrochemical Society

Publikationsdatum: 2007