In:
Optics Express, Optica Publishing Group, Vol. 29, No. 22 ( 2021-10-25), p. 35261-
Kurzfassung:
We fabricate three-dimensional wavelength-division multiplexing (3D-WDM) interconnects comprising three Si x N y layers using a CMOS-compatible process. In these interconnects, the optical signals are coupled directly to a Si x N y grating coupler in the middle Si x N y layer and demultiplexed by a 1 × 4 Si x N y array waveguide grating (AWG). The demultiplexed optical signals are interconnected from the middle Si x N y layer to the bottom and top Si x N y layers by four SiO x N y interlayer couplers. A low insertion loss and low crosstalk are achieved in the AWG. The coupling losses of the SiO x N y interlayer couplers and Si x N y grating coupler are ∼1.52 dB and ∼4.2 dB, respectively.
Materialart:
Online-Ressource
ISSN:
1094-4087
Sprache:
Englisch
Verlag:
Optica Publishing Group
Publikationsdatum:
2021
ZDB Id:
1491859-6