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COMPREHENSIVE MODIFICATION OF SEMICONDUCTORS AND METALS PROVIDING NEW STRUCTURAL FEATURES OF SURFACE LAYERS SUBJECTED TO COMPRESSION PLASMA FLOWS

Astashinski, V. M. ; Ananin, S. I. ; Kostyukevich, E. A. ; [et al.]

Begell House ; 2007

In: High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) Vol. 11, No. 4 ( 2007), p. 537-548

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In: High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes), Begell House, Vol. 11, No. 4 ( 2007), p. 537-548

Type of Medium: Online Resource

ISSN: 1093-3611

URL: Issue

URL: Article

DOI: 10.1615/HighTempMatProc.v11.i4

DOI: 10.1615/HighTempMatProc.v11.i4.60

Language: English

Publisher: Begell House

Publication Date: 2007

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Kooperativer Bibliotheksverbund

Berlin Brandenburg