In:
International Journal of Automation Technology, Fuji Technology Press Ltd., Vol. 7, No. 6 ( 2013-11-05), p. 720-725
Abstract:
The atmospheric microplasma metal organic chemical vapor deposition (AP-MOCVD) using titanium (IV) tetraisopropoxide (TTIP) as a metal alkoxide titanium source was investigated for depositing TiC and TiN hard coatings on stainless steel rods for improving the tool life of electroplated diamond tools. The components and morphology of the coating deposited by microplasma AP-MOCVD with several gas sources and different processes was observed and analyzed. The titanium-based hard coatings composed of TiC, TiN, and TiO2 was successfully obtained by microplasma AP-MOCVD using TTIP as a metal alkoxide titanium source with mixed gases (CH 4 , N 2 , H 2 , and Ar). For the fabrication of titanium-based coatings (TiC, TiN) by microplasma AP-MOCVD, it is important that the carbon and oxygen content, which are components of TTIP, are reduced. The addition of hydrogen gas in the microplasma AP-MOCVD process, followed by nitriding effectively reduces the carbon and oxygen content in the coating.
Type of Medium:
Online Resource
ISSN:
1883-8022
,
1881-7629
DOI:
10.20965/ijat.2013.p0720
Language:
English
Publisher:
Fuji Technology Press Ltd.
Publication Date:
2013
detail.hit.zdb_id:
2942224-3
