In:
Advanced Materials Research, Trans Tech Publications, Ltd., Vol. 1096 ( 2015-4), p. 62-68
Abstract:
In this paper, we have prepared the beta-FeSi 2 thin film on Si substrate through the direct current magnetron sputtering technology. We have tested the samples by XRD, optical digital microscope (ODM), spectrophotometer, and SEM. Under the same annealing temperature at 1153 K, the annealing time has important influence on the optical characteristic of beta-FeSi 2 thin film. More the thickness of the beta-FeSi 2 thin film is thinner, and more the absorptivity of photo is higher. We should use the thinner beta-FeSi 2 thin film with appropriate value of the thickness and must adopt the anti-reflection layer to fabricate the solar cell.
Type of Medium:
Online Resource
ISSN:
1662-8985
DOI:
10.4028/www.scientific.net/AMR.1096
DOI:
10.4028/www.scientific.net/AMR.1096.62
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2015
detail.hit.zdb_id:
2265002-7