In:
Materials Science Forum, Trans Tech Publications, Ltd., Vol. 573-574 ( 2008-3), p. 279-293
Abstract:
In this contribution we illustrate some important features of the development of models
for the simulation of advanced annealing processes. Taking arsenic as example we discuss the challenges that the last technology trends represent for process modeling. Issues like shallow implants,
high doses, low total thermal budgets, and steep temperature profiles are discussed, highlighting the physical phenomena to take into account, and how to design models that reproduce them. We also
discuss with examples how important are the critical evaluation of known parameters and established approaches, and the extraction of parameters from experiments. Finally we show some applications
of our model for spike and flash annealing of arsenic implants.
Type of Medium:
Online Resource
ISSN:
1662-9752
DOI:
10.4028/www.scientific.net/MSF.573-574
DOI:
10.4028/www.scientific.net/MSF.573-574.279
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2008
detail.hit.zdb_id:
2047372-2