In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 53, No. 3 ( 2014-03-01), p. 033201-
Kurzfassung:
We report the fabrication of textured VO 2− x films on c -cut sapphire substrates by postdeposition annealing of V 2 O 3 films prepared by RF magnetron sputtering using V 2 O 3 as the target. Although the prepared VO 2− x films are expected to be oxygen-deficient, overoxidation on the film surface was revealed by X-ray photoelectron spectroscopy. The metal–insulator transition (MIT) characteristics of the VO 2− x films were investigated. MIT parameters including the transition temperature, transition sharpness, and hysteresis width of the VO 2− x films were manipulated by varying the oxygen pressure during postdeposition annealing. The suppression of optical transmittance in the near-infrared region was observed by increasing the temperature through the MIT.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAP.53.033201
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
2014
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7