In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 55, No. 6S1 ( 2016-06-01), p. 06GP11-
Kurzfassung:
We report on novel X-ray mirrors fabricated with a focused ion beam for future astronomical missions. We fabricated a test sample from a silicon wafer by forming six slits whose sidewalls were used as X-ray reflection surfaces. The six slits were designed with a size of 25 × 300 × 170 µm 3 and with different inclination angles of 0 and ±1°. We examined X-ray reflection using three slits with different inclination angles at Al Kα 1.49 keV. Consequently, we demonstrated X-ray reflection from all the three slits. All the sidewalls have multiangular components with a microroughness of ∼1 nm rms. ∼30–45% of the total surface area is effective for X-ray reflection. We confirmed that the inclination angles are consistent with the designed values.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAP.55.06GP11
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
2016
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7