Format:
Online-Ressource
ISSN:
1521-3862
Content:
The growth of ultrathin Ta‐N films at the initial stages of atomic layer deposition was investigated by in situ X‐ray photo‐electron spectroscopy (XPS) starting from the first precursor pulse. The chemical composition, the growth mode and the film thickness are derived in dependence on the cycle number and the substrate chemistry.
In:
volume:17
In:
number:1‐3
In:
year:2011
In:
pages:37-44
In:
extent:8
In:
Chemical vapor deposition, Weinheim : Wiley-VCH, 1995-2015, 17, Heft 1‐3 (2011), 37-44 (gesamt 8), 1521-3862
Language:
English
DOI:
10.1002/cvde.201006874
URN:
urn:nbn:de:101:1-2023032810030880445521
URL:
https://doi.org/10.1002/cvde.201006874
URL:
https://nbn-resolving.org/urn:nbn:de:101:1-2023032810030880445521
URL:
https://d-nb.info/1284579123/34
URL:
https://doi.org/10.1002/cvde.201006874
