Format:
Online-Ressource
ISSN:
1521-4095
Content:
A successful method to fabricate large‐area, microstructured sieve materials (see Figure) from a poly (p‐phenylene–vinylene) (PPV) precursor and from poly (3‐octylthiophene) (P3OT) is reported. Strong periodicity and a large, defect‐free area make this structure extremely interesting for polymer optoelectronics. The underlying mechanism of the self‐organized pattern‐formation is elaborated in this work.
In:
volume:13
In:
number:8
In:
year:2001
In:
pages:588-591
In:
extent:4
In:
Advanced materials, Weinheim : Wiley-VCH, 1989-, 13, Heft 8 (2001), 588-591 (gesamt 4), 1521-4095
Language:
English
DOI:
10.1002/1521-4095(200104)13:8〈588::AID-ADMA588〉3.0.CO;2-C
URN:
urn:nbn:de:101:1-2023111105545812644719
URL:
https://doi.org/10.1002/1521-4095(200104)13:8〈588::AID-ADMA588〉3.0.CO;2-C
URL:
https://nbn-resolving.org/urn:nbn:de:101:1-2023111105545812644719
URL:
https://d-nb.info/1309427380/34
URL:
https://doi.org/10.1002/1521-4095(200104)13:8〈588::AID-ADMA588〉3.0.CO;2-C