Format:
1 Online-Ressource (804 pages)
ISBN:
9789811042171
Content:
"Contents" -- "1 Asian African Association for Plasma Training (AAAPT)âHistory, Network, Activities, and Impact" -- "1.1 Introduction to Asian African Association for Plasma Training (AAAPT)" -- "1.2 Missions, Goals, and Impact of AAAPT" -- "1.3 Events Leading to the Formation of AAAPT" -- "1.4 Overview of AAAPT Activities" -- "1.4.1 Group Training Programmes and Colleges Organized and Supported by AAAPT" -- "1.4.2 Activities at AAAPT Training Centres [1991â2003]" -- "1.4.3 AAAPT Network Activities 2005 Onwards" -- "1.4.4 Facilities Transferred or Developed After Training Programmes or Collaborative Visits Under AAAPT Network Activities" -- "1.4.5 Numerical Simulation Workshops" -- "1.4.6 Symposia, Workshops, and Conferences Organized or Co-organized by AAPPT" -- "1.5 Summarizing Success of AAAPT" -- "Acknowledgements" -- "References" -- "2 Dense Plasma FocusâHigh-Energy-Density Pulsed Plasma Device Based Novel Facility for Controlled Material Processing and Synthesis" -- "2.1 Introduction" -- "2.2 Material Synthesis and Processing" -- "2.3 Plasmas for Material Synthesis and Processing" -- "2.3.1 Low-Temperature Plasmas (LTPs) for Material Synthesis and Processing" -- "2.3.2 High-Temperature Plasmas for Material Synthesis and Processing" -- "2.4 Dense Plasma Focus (DPF) Device: Introduction, Principle, and Characteristics" -- "2.4.1 DPF Device Details" -- "2.4.2 Principle of Operation: Plasma Dynamics in DPF Device" -- "2.4.3 Key Characteristics of DPF Device" -- "2.4.4 Plasma Lifetime in DPF Device and Some Features of Post Pinch Phase" -- "2.5 Material Processing and Synthesis Using DPF DeviceâTimeline of Milestones" -- "2.6 Material Processing Using DPF Device" -- "2.6.1 Mechanism and Physical Processes for Material Processing in DPF Device" -- "2.6.2 Selective Examples of Material Processing
Content:
"2.6.2.1 Processing of Bulk Substrate Surface" -- "2.6.2.2 Processing of Thin/Thick Films" -- "2.7 Material Synthesis/Deposition Using DPF Device" -- "2.7.1 Advantages of DPF-Based Depositions" -- "2.7.1.1 High Deposition Rates" -- "2.7.1.2 Ability to Grow Crystalline Thin Films at Room Temperature" -- "2.7.1.3 Superior Physical Properties" -- "2.7.1.4 Versatile Deposition Facility with a Variety of Deposition Options" -- "2.7.2 Understanding Mechanisms of Material Synthesis in DPF Device" -- "2.8 Scalability of DPF Devices for Material Processing and Synthesis" -- "2.9 Conclusions" -- "References" -- "3 The Plasma FocusâNumerical Experiments, Insights and Applications" -- "3.1 Introduction" -- "3.1.1 Introduction to the Plasma FocusâDescription of the Plasma Focus. How It Works, Dimensions and Lifetimes of the Focus Pinch" -- "3.1.2 Review of Models and Simulation" -- "3.1.3 A Universal Code for Numerical Experiments of the Mather-Type Plasma Focus" -- "3.2 Lee Model Code" -- "3.2.1 The Physics Foundation and Wide-Ranging Applications of the Code" -- "3.2.2 The Five Phases of the Plasma Focus" -- "3.2.3 The Equations of the Five Phases" -- "3.2.3.1 Axial Phase (Snowplow Model)" -- "Equation of Motion" -- "Circuit (Current) Equation" -- "Normalizing the Generating Equations to Obtain Characteristic Axial Transit Time, Characteristic Axial Speed and Speed Factor S -- and Scaling Parameters of Times, α and Inductances β" -- "Calculate Voltage Across Input Terminals of Focus Tube" -- "Integration Scheme for Normalized Generating Equations" -- "3.2.3.2 Radial Inward Shock Phase (Slug Model)" -- "Motion of Shock Front" -- "Elongation Speed of CS (Open-Ended at Both Ends)" -- "Radial Piston Motion" -- "Circuit Equation During Radial Phase
Content:
"Normalizing the Generating Equations to Obtain Characteristic Radial Transit Time, Characteristic Radial Transit Speed and Speed Factor S -- and Scaling Parameters for Times α1 and Inductances β1 -- also Compare Axial to Radial Length Scale, Time Scale and Speed Scale" -- "Calculate Voltage V Across PF Input Terminals" -- "Integrating for the Radial Inward Shock Phase" -- "Correction for Finite Acoustic (Small Disturbance) Speed" -- "3.2.3.3 Radial Reflected Shock (RS) Phase" -- "Reflected Shock Speed" -- "Piston Speed" -- "Elongation Speed" -- "Circuit Equation" -- "Tube Voltage" -- "3.2.3.4 Slow Compression (Pinch) Phase" -- "Radiation-Coupled Dynamics (Piston) Equation" -- "Joule Heating Component of dQ/dt" -- "Radiation Components of dQ/dt" -- "Plasma Self-absorption and Transition from Volumetric Emission to Surface Emission" -- "Neutron Yield" -- "Column Elongation" -- "Circuit Current Equation" -- "Voltage Across Plasma Focus Terminals" -- "Pinch Phase Dynamics and Yields of Neutrons, Soft X-rays, Ion Beams and Fast Plasma Stream" -- "3.2.3.5 Expanded Column Axial Phase" -- "3.2.4 Procedure for Using the Code" -- "3.2.5 Adding a 6th Phase: From Pinch (Slow Compression) Phase to Large Volume Plasma Phase-Transition Phase 4a" -- "3.2.5.1 The 5-Phase Model Is Adequate for Low Inductance L0 Plasma Focus Devices" -- "3.2.5.2 Factors Distinguishing the Two Types of Plasma Focus Devices" -- "3.2.5.3 Procedure for Using 6-Phase CodeâControl Panel for Adding Anomalous Phases" -- "3.2.6 Conclusion for Description of the Lee Model Code" -- "3.3 Scaling Properties of the Plasma Focus Arising from the Numerical Experiments" -- "3.3.1 Various Plasma Focus Devices" -- "3.3.2 Scaling Properties (Mainly Axial Phase)" -- "3.3.3 Scaling Properties (Mainly Radial Phase)" -- "3.3.4 Scaling Properties: Rules of Thumb
Content:
"3.3.5 Designing an Efficient Plasma Focus: Rules of Thumb [10]" -- "3.3.6 Tapered Anode, Curved Electrodes, Current-Stepped PF, Theta Pinch" -- "3.3.6.1 Tapered Anode" -- "3.3.6.2 Curved Electrodes" -- "Bora Plasma Focus" -- "Spherical Plasma Focus, KU200" -- "A Note on the 2-D Model of Abdul Al-Halim et al." -- "3.3.6.3 Current-Stepped Plasma Focus" -- "3.3.6.4 Procedure to Use Lee Code for the Above Devices" -- "3.3.6.5 Theta Pinch Version of the Code" -- "3.4 Insights and Scaling Laws of the Plasma Focus Arising from the Numerical Experiments" -- "3.4.1 Using the Lee Model Code as Reference for Diagnostics" -- "3.4.1.1 Comments on Computed Quantities by Lee Model Code" -- "3.4.1.2 Correlating Computed Plasma Dynamics with Measured Plasma PropertiesâA Very Powerful Diagnostic Technique" -- "3.4.2 Insight 1âPinch Current Limitation Effect as Static Inductance Is Reduced Towards Zero" -- "3.4.3 Neutron Yield Limitations Due to Current Limitations as L0 Is Reduced" -- "3.4.4 Insight 2âScaling Laws for NeutronâScaling Laws for Neutrons from Numerical Experiments Over a Range of Energies from 10Â kJ to 25Â MJ" -- "3.4.5 Insight 3âScaling Laws for Soft X-ray Yield" -- "3.4.5.1 Computation of Neon SXR Yield" -- "3.4.5.2 Scaling Laws for Neon SXR Over a Range of Energies from 0.2Â kJ to 1Â MJ" -- "3.4.6 Insight 4âScaling Laws for Fast Ion Beams and Fast Plasma Streams from Numerical Experiments" -- "3.4.6.1 Computation of Beam Ion Properties" -- "3.4.6.2 The Ion Beam Flux and Fluence Equations" -- "3.4.6.3 Consequential Properties of the Ion Beam [59]" -- "3.4.6.4 Fast Ion Beam and Fast Plasma Stream Properties of a Range of Plasma Focus DevicesâInvestigations of Damage to Plasma Facing Wall Materials in Fusion Reactors
Content:
"3.4.6.5 Slow Focus Mode SFM Versus Fast Focus Mode FFM-Advantage of SFM for Fast Plasma Stream Nano-materials Fabrication: Selection of Energy of Bombarding Particles by Pressure Control [63]" -- "3.4.6.6 The Dual PF (DuPF)âOptimizing FFM and SFM in One Machine [61]" -- "3.4.7 Insight 5âNeutron Saturation" -- "3.4.7.1 The Global Neutron Scaling Law" -- "3.4.7.2 The Dynamic Resistance" -- "3.4.7.3 The Interaction of a Constant Dynamic Resistance with a Reducing Generator Impedance Causes Deterioration in Current Scaling" -- "3.4.7.4 Deterioration in Current Scaling Causes Deterioration in Neutron Scaling" -- "3.4.7.5 Beyond Presently Observed Neutron Saturation Regimes" -- "3.4.7.6 Neutron ScalingâIts Relationship with the Plasma Focus Properties" -- "3.4.7.7 Relationship with Plasma Focus Scaling Properties" -- "3.4.8 Summary of Scaling Laws" -- "3.5 Radiative Cooling and Collapse in Plasma Focus" -- "3.5.1 Introduction to Radiative Cooling" -- "3.5.2 The Radiation-Coupled Dynamics for the Magnetic Piston" -- "3.5.3 The Reduced Pease-Braginskii Current" -- "3.5.3.1 The Reduced Pease-Braginskii Current for PF1000 at 350Â kJ" -- "3.5.3.2 The Reduced Pease-Braginskii Current for INTI PF at 2Â kJ" -- "3.5.4 Effect of Plasma Self-absorption" -- "3.5.5 Characteristic Times of Radiation" -- "3.5.5.1 Definition-Pinch Energy/Radiation Power" -- "3.5.5.2 Characteristic Depletion Time for Bremsstrahlung" -- "3.5.5.3 Characteristic Depletion Time for Line Radiation" -- "3.5.5.4 Characteristic Depletion Time tQ for PF1000" -- "3.5.5.5 Characteristic Depletion Time tQ for INTI PF" -- "3.5.6 Numerical Experiments on PF1000 and INTI PF" -- "3.5.6.1 Fitting for Model Parameters in PF1000" -- "3.5.6.2 PF 1000 in Deuterium and HeliumâPinch Dynamics Showing no Sign of Radiative Cooling or Collapse
Content:
"3.5.6.3 PF 1000 in Neon 23Â kV, 1Â TorrâPinch Dynamics Showing Signs of Radiative Cooling and Enhanced Compression
Additional Edition:
9789811042164
Additional Edition:
Erscheint auch als Druck-Ausgabe Rawat, Rajdeep Singh Plasma Science and Technology for Emerging Economies : An AAAPT Experience Singapore : Springer Singapore,c2017 9789811042164
Language:
English
URL:
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