UID:
almahu_9947357765502882
Format:
1 online resource (various pagings) :
,
illustrations (some color).
ISBN:
9781681740843
,
9781681742120
Series Statement:
[IOP release 2]
Content:
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Note:
"Version: 20151001"--Title page verso.
,
"A Morgan & Claypool publication as part of IOP Concise Physics"--Title page verso.
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Preface -- Acknowledgements -- Author biography -- 1. Metrology -- 1.1. What is metrology? -- 1.2. Metrology in the FIB
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2. Focused ion beam -- 2.1. Introduction to the FIB instrument -- 2.2. Types of instrument -- 2.3. Gas injection systems -- 2.4. Patterning options -- 2.5. Other equipment and techniques found on FIB instruments
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3. Ion-solid interactions -- 3.1. Overview -- 3.2. Imaging-secondary electrons and secondary ions -- 3.3. Ion milling-ion range, sputter yield and damage -- 3.4. Software to approximate ion range, damage and sputter yield
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4. Focused ion beam-materials science applications -- 4.1. Overview -- 4.2. TEM foils and cross-sectioning -- 4.3. Three-dimensional reconstruction -- 4.4. Mechanical testing -- 4.5. Residual stress measurement and deformation -- 4.6. Secondary ion mass spectrometry and atom probe
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5. Focused ion beam fabrication for metrology -- 5.1. Overview -- 5.2. Superconducting devices -- 5.3. Utilising manipulation systems -- 5.4. AFM cantilevers and dimensional artefacts for scanning probe techniques -- 5.5. Other devices
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6. Future developments -- 6.1. Where we currently are -- 6.2. The end of the Ga ion source? -- 6.3. Final thoughts.
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Also available in print.
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Mode of access: World Wide Web.
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System requirements: Adobe Acrobat Reader.
Additional Edition:
Print version: ISBN 9781681740201
Language:
English
DOI:
10.1088/978-1-6817-4084-3
URL:
http://iopscience.iop.org/book/978-1-6817-4084-3
