UID:
almafu_9959239710002883
Format:
1 online resource (xvi, 470 pages) :
,
digital, PDF file(s).
ISBN:
1-316-08509-0
,
1-139-63642-1
,
1-139-64893-4
,
1-139-63848-3
,
1-139-64132-8
,
1-139-16442-2
Content:
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Note:
Title from publisher's bibliographic system (viewed on 05 Oct 2015).
,
Cover; Half-title; Title; Copyright; Dedication; Contents; PREFACE; ACKNOWLEDGMENTS; CHAPTER 1. INTRODUCTION; 1.1 The Soft X-Ray and Extreme Ultraviolet Regions of the Electromagnetic Spectrum; 1.2 Basic Absorption and Emission Processes; 1.3 Atomic Energy Levels and Allowed Transitions; 1.4 Scattering, Diffraction, and Refraction of Electromagnetic Radiation; References; Homework Problems; CHAPTER 2. RADIATION AND SCATTERING AT EUV AND SOFT X-RAY WAVELENGTHS; 2.1 Maxwell's Equations and the Wave Equation; 2.2 Calculating Scattered Fields; 2.3 Radiated Power and Poynting's Theorem
,
2.4 Scattering Cross Sections2.5 Scattering by a Free Electron; 2.6 Scattering by Bound Electrons; 2.7 Scattering by a Multi-electron Atom; References; Homework Problems; CHAPTER 3. WAVE PROPAGATION AND REFRACTIVE INDEX AT EUV AND SOFT X-RAY WAVELENGTHS; 3.1 The Wave Equation and Refractive Index; 3.2 Phase Variation and Absorption of Propagating Waves; 3.3 Reflection and Refraction at an Interface; 3.4 Total External Reflection of Soft X-Rays and EUV Radiation; 3.5 Reflection Coefficients at an Interface; 3.5.1 E0 Perpendicular to the Plane of Incidence
,
3.5.2 E0 Parallel to the Plane of Incidence3.6 Brewster's Angle; 3.7 Field Penetration into a Lossy Medium Near the Critical Angle; 3.8 Determination of d and ß: The Kramers-Kronig Relations; 3.9 Applications to Glancing Incidence Optics; 3.10 Enhanced Reflectivity from Periodic Structures; References; Homework Problems; CHAPTER 4. MULTILAYER INTERFERENCE COATINGS; 4.1 Introduction; 4.2 Constructive Interference of Scattered Radiation; 4.3 Computational Model for Calculating Reflection from a Multilayer Mirror; 4.4 Multilayer Fabrication; 4.5 Applications of Multilayer Coated Optics
,
4.5.1 Soft X-Ray and Extreme Ultraviolet Photoemission Microscopy for Surface Science4.5.2 Extreme Ultraviolet and Soft X-Ray Astronomy; 4.5.3 Extreme Ultraviolet Lithography; 4.5.4 Plasma Diagnostics; 4.5.5 Polarization Studies of Magnetic Materials; 4.5.6 The X-Ray Microprobe; References; Homework Problems; CHAPTER 5. SYNCHROTRON RADIATION; 5.1 Introduction; 5.2 Characteristics of Bending Magnet Radiation; 5.3 Characteristics of Undulator Radiation; 5.3.1 Undulator Radiation Pattern; 5.3.2 The Central Radiation Cone
,
5.4 Undulator Radiation: Calculations of Radiated Power, Brightness, and Harmonics5.4.1 The Undulator Equation; 5.4.2 Comments on Undulator Harmonics; 5.4.3 Power Radiated in the Central Radiation Cone; 5.4.4 Power as a Function of Angle and Total Radiated Power; 5.4.5 Spectral Bandwidth of Undulator Radiation; 5.4.6 Spectral Brightness of Undulator Radiation; 5.4.7 Time Structure; 5.4.8 Polarization Properties of Undulator Radiation; 5.5 The Scale of Harmonic Motion; 5.6 The Transition from Undulator to Wiggler Radiation; 5.7 Wiggler Power and Flux; 5.8 Femtosecond Pulse Generation
,
References
,
English
Additional Edition:
ISBN 0-521-02997-X
Additional Edition:
ISBN 0-521-65214-6
Language:
English
URL:
https://doi.org/10.1017/CBO9781139164429
