ISSN:
2214-7853
Content:
A multitude gratings design consists of gratings with different pitches ranging from the micrometre down to sub 40 nm scale combined with sub 10 nm step heights modulating the surface morphology for length scale measurements is proposed. The surface morphology modulation was performed using electron beam lithography incorporating a standard semiconductor processing technology. The critical dimension, edge roughness, step heights and line morphology in dependence on the grating pitch is studied.
In:
Materials today. proceedings, Amsterdam [u.a.] : Elsevier, 2014, 53(2022), 2, Seite 289-292, 2214-7853
In:
volume:53
In:
year:2022
In:
number:2
In:
pages:289-292
Language:
English
DOI:
10.1016/j.matpr.2021.06.427
URL:
Volltext
(lizenzpflichtig)
Author information:
Stauffenberg, Jaqueline 1994-
Author information:
Hähnlein, Bernd 1983-
Author information:
Manske, Eberhard 1956-
Author information:
Pezoldt, Jörg
Author information:
Jacobs, Heiko O. 1970-