Format:
graph. Darst., Ill.
ISSN:
1521-4095
Content:
Metal assisted chemical etching, metallurgical silicon, silicon nanowire, metal impurities, photoelectrochemical cell
In:
Advanced materials, Weinheim : Wiley-VCH, 1989, 25(2013), 23, Seite 3187-3191, 1521-4095
In:
volume:25
In:
year:2013
In:
number:23
In:
pages:3187-3191
Language:
English
DOI:
10.1002/adma.201300973
Author information:
Wehrspohn, Ralf B. 1970-