Format:
Online-Ressource
ISSN:
1612-8869
Content:
Abstract: Radial‐profile control of cylindrical plasma source with 500 mm in diameter has been carried out using multiple low‐inductance antenna (LIA) units. Measurements of ion saturation current in the cylindrical chamber demonstrated an excellent control capability of radial distribution by adjusting the power‐deposition profile. The non‐uniformity of radial distributions was improved from 8.3% to 5.4% with the plasma control technologies. The results indicate that the plasma control technologies with multiple LIA units are quite attractive as a plasma source for large‐area wafer processes over 450 mm in diameter, which inherently require excellent profile control capabilities.
In:
volume:6
In:
number:S1
In:
year:2009
In:
pages:S278-S281
In:
extent:4
In:
Eleventh International Conference on Plasma Surface Engineering (PSE2008) 1
In:
Plasma processes and polymers, Weinheim : Wiley-VCH, [2004]-, 6, Heft S1 (2009), S278-S281 (gesamt 4), Eleventh International Conference on Plasma Surface Engineering (PSE2008) 1, 1612-8869
Language:
English
DOI:
10.1002/ppap.200930609
URN:
urn:nbn:de:101:1-2023042006182855285953
URL:
https://doi.org/10.1002/ppap.200930609
URL:
https://nbn-resolving.org/urn:nbn:de:101:1-2023042006182855285953
URL:
https://d-nb.info/1286703387/34
URL:
https://doi.org/10.1002/ppap.200930609